Growth and characterization of α-, β-, and ϵ-phases of Ga2O3 using MOCVD and HVPE techniques

By Yao Yao, S. Okur, Luke A. M. Lyle, G. Tompa, T. Salagaj, N. Sbrockey, R. Davis, L. Porter. 2018

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ABSTRACT Heteroepitaxial films of GaO were grown on c-plane sapphire (0001). The stable phase β-GaO was grown using the metalorganic chemical vapor deposition technique, regardless of precursor flow rates, at temperatures between 500C and 850C. Metastable α- and ϵ-phases were grown when using the halide vapor phase epitaxy (HVPE) technique, at growth temperatures between 650C and 850C, both separately and in combination. XTEM revealed the better lattice-matched α-phase growing semi-coherently on the substrate, followed by ϵ-GaO. The epitaxial relationship was determined to be [] ϵ-GaO [] α-GaO [] α-AlO. SIMS revealed that epilayers forming the ϵ-phase contain higher concentrations of Cl introduced during HVPE growth. GRAPHICAL ABSTRACT IMPACT STATEMENT This study demonstrates one of the first epitaxial growths of multiple polymorphs of GaO on sapphire (0001) substrates, including its β-, α-, and ϵ-phases. Epitaxial relationship is confirmed through HRTEM.

Subfields: Electronic, Optical and Magnetic Materials, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/0598280921aa1e172fc01f769b79fd39d06848fb