Turning silicon on its edge [double gate CMOS/FinFET technology]

By Edward J. Nowak, Ingo Dr Aller, Thomas Ludwig, Keunwoo Kim, R. Joshi, Ching-Te Chuang, Kerry Bernstein, Ruchir Puri. IEEE Circuits and Devices Magazine, 2004

378 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/04846809e9fb8a382e451a441e2445bf4683b61d