Plasma-assisted simultaneous reduction and nitrogen doping of graphene oxide nanosheets
By Nanjundan Ashok Kumar, Hugo Nolan, Niall McEvoy, E. Rezvani, R. Doyle, Michael E. G. Lyons, Georg S. Duesberg. 2013
202 citations recorded by the source corpus.
An environmentally benign and scalable route for the production of gram scale quantities of nitrogen-doped graphene using a downstream microwave plasma source is reported. Simultaneous reduction and doping of graphene oxide is achieved and the process negates the need for high temperatures and toxic solvents associated with existing methods. This gas-phase low temperature process is completely dry and, thus, minimises re-aggregation of graphene flakes which is typically associated with liquid phase reduction methods. The resulting material has many potential uses, particularly in electrochemical energy.
Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/002167c749d575d54b8c404874e9229b704565c7
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In Materials Chemistry
Citations in the corpus
- Surface modification of graphene and graphite by nitrogen plasma: Determination of chemical state alterations and assignments by quantitative X-ray photoelectron spectroscopy (2015, background): “The temperature and the duration of the treatment allow for further fine tuning of the nitrogen content [15,16].”